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Title: |
Simulation of Deposition Processes with PECVD Apparatus |
Search Result:
| By (author): |
Juergen Geiser, Meraa Arab |
| ISBN10-13: |
1621003655 : 9781621003656 |
| Format: |
Hardback |
| Size: |
155x230mm |
| Pages: |
144 |
| Weight: |
.344 Kg. |
| Published: |
Nova Science Publishers, Inc (US) - January 2012 |
| List Price: |
101.99 Pounds Sterling |
| Availability: |
Temporarily Out of Stock, more expected soon
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| Subjects: |
Materials science |
| This book discusses the study of simulating the growth of a thin film by chemical vapour deposition (CVD) processes. In recent years, due to the research in producing high-temperature films by depositing low pressures, the processes have increased and understanding the control mechanism of such processes has become very important. An underlying hierarchy of models for low-temperature and low-pressure plasma is presented in order to discuss the processes that can be used to implant or deposit thin layers of important materials. Due to the multi-scale problem of the flow and reaction processes, the authors propose multi-scale problems which are divided into near-field and far-field models. |
| Table of Contents: |
| Preface; Introduction; Modeling; Mathematical Methods; Numerical Experiments; Conclusion; Bibliography; Index. |
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